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 Technologies > UBM Sputter |
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UBM Sputter |
(Unbalanced Magnetron Sputter) |
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The permanent magnet mounted in the cathode generates the magnetic field
that interacts with the electrical field applied to the target. As a result,
the plasma density near the target increases. Due to this effect, the discharge
current increases and the sputter speed is improved.
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Especially, the UBM sputter is a device that improves the sputter efficiency
by applying different field strengths to the internal magnet and the external
magnet.
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