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Linear Ion Source
Linear Ion Source
J&L’s LIS(Linear Ion Source) system is a closed-drift or anode-layer ion beam source enable to irradiate uniform ion beams over a large area.
It is able to obtain relatively high energy (50~1,500eV) and easily generating an ion beam from most inert gases and some active gases.
Applicable field of LIS system is cleaning, deposition and IBAD (Ion Beam Assisted Deposition), and DLC coating uses an affiliation of hydrocarbon gas.
METALLION™ is a coating system that uses arc discharge to evaporate the metal target
of the cathode and deposit it on the surface.
Various metal coatings such as TiN, TiCN, TiAlN, and CrN are available depending on the target used.
All specifications of the system are optimized and provided according to the customer's requirements.
Characteristics and Specifications of Linear Ion Source
- Provides stable ion energy during deposition
- Excellent coating layer forming even though large-area deposition
- Low maintenance costs
- High Adhesion
- Cleaning using Ar, O2, N2 gas
| Deposition Rate | 300nm/min |
| Residual Stress | ~ 2.0GPa |
| Hardness | ~ 28GPa |
| Friction Coefficient | ~ 0.1 |
| LIS350 | LIS650 | LIS800 | LIS1000 | LIS1200 | |
| Size (mm) | W102 × H380 | W102 × H680 | W102 × H840 | W102 × H1044 | W102 × H1244 |
| Type of Magnet | Permanent magnet | ||||
| Coating effective area | 340mm | 656mm | 790mm | 990mm | 1190mm |
| Coating Uniformity | ± 3% | ||||
| Voltage | 500 ~ 3000V | ||||
| Operative Pressure | 0.7 ~ 3mTorr | ||||
| Source | Ar, N2, O2, C2H2, CH4, etc | ||||
