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Linear Ion Source​

Linear Ion Source
  • J&L’s LIS(Linear Ion Source) system is a closed-drift or anode-layer ion beam source enable to irradiate uniform ion beams over a large area. It is able to obtain relatively high energy (50~1,500eV) and easily generating an ion beam from most inert gases and some active gases.
  • Applicable field of LIS system is cleaning, deposition and IBAD (Ion Beam Assisted Deposition), and DLC coating uses an affiliation of hydrocarbon gas.
Characteristics and Specifications of Linear Ion Source
  • Provides stable ion energy during deposition
  • Excellent coating layer forming even though large-area deposition
  • Low maintenance costs
  • High Adhesion
  • Cleaning using Ar, O2, N2 gas
Deposition Rate 300nm/min
Residual Stress ~ 2.0GPa
Hardness ~ 28GPa
Friction Coefficient ~ 0.1
LIS350 LIS650 LIS800 LIS1000 LIS1200
Size (mm) W102 × H380 W102 × H680 W102 × H840 W102 × H1044 W102 × H1244
Type of Magnet Permanent magnet
Coating effective area 340mm 656mm 790mm 990mm 1190mm
Coating Uniformity ± 3%
Voltage 500 ~ 3000V
Operative Pressure 0.7 ~ 3mTorr
Source Ar, N2, O2, C2H2, CH4, etc