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Technical Institution
Since its establishment in 2000, J&L's Plasma R&D center has been leading the field of plasma surface treatment at domestic and foreign.
Research staffs from Master's and Doctoral in physics, metal, material, electronic majors provides customized integration solutions through product development, mass production research, and application.
Since its establishment in 2000, J&L's Plasma R&D center has been leading the field of plasma surface treatment at domestic and foreign.
Research staffs from Master's and Doctoral in physics, metal, material, electronic majors provides customized integration solutions through product development, mass production research, and application.
J&L의 플라즈마 연구소는 2000년 설립 이후 국내외 플라즈마 표면처리 분야를 선도해왔습니다. 물리, 금속, 재료, 전기 전공의 석·박사 전문인력으로 구성된 연구진이 제품개발, 양산화 연구 및 적용을 통해 고객맞춤 통합 솔루션을 제공해드립니다.
Study Fields
Research of Thin Film synthesis
Basic Research
- Analysis of various thin film structures and compositions
- Physical properties and structural changes of thin films according to synthesis parameters
- Physical, Structural and Mechanical Properties of Plasma Coating Products
Synthesis process R&D
- New concept synthesis process invention research/ System development
- Mass production of large-area product
Applied Research
- Thin film’s residual stress control for increasing adhesion
- 3D coating technology development
Coating on Large size product - Nano-structures generation through surface treatment
System development research
- Design of Automatic In-line coating system
- Development of Large-area plasma source
- Plasma source improvement using simulation modelling